- 產(chǎn)品型號：
- UB－6200半導體晶體集成電路檢測用顯微鏡
- 類型：
- 金相顯微鏡
工業(yè)顯微鏡廣泛應(yīng)用于半導體,電子工業(yè)進行晶體,集成電路的檢驗和科學研究. 配備有反射照明,成象和觀察系統(tǒng),偏光裝置. Industrial microscope is widely used for crystal, integrated circuit (IC) examination and research. It is supplied with reflected illumination, imaging and viewing system, polarized imaging system. 規(guī)格 Specifications ◇ 無限遠光學系統(tǒng),管鏡焦距200mm Infinitive Optical System, Tube Lens Focal Length 200mm ◇ 鉸鏈式三目鏡筒,30°傾斜, 瞳距55-75mm Compensation Free Trinocular Tube, Inclined at 30°, Interpupillary Distance 55-75mm ◇ 高眼點,大視場目鏡WF10X/22 High Point and Wide Field Eyepiece WF10/22 ◇ 長工作距離,平場復消色差物鏡2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42 Long Working Distance, Plan Apo Objectives 2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42 ◇ 五孔物鏡轉(zhuǎn)換器 Quintuple Nosepiece ◇ 6″雙層活動平臺和圓平臺 6″Double Layers Mechanical Stage and circle stage ◇ 同軸粗微調(diào)焦機構(gòu),微動格值0.002mm Coaxial Coarse & Fin Focus Adjustment System, Fine Division 0.002mm ◇照明系統(tǒng) Illumination System 冷光源光纖反射照明器:12V150W Cold Light Fiber Reflected Illnminator: 12V150W
